Advanced colloidal lithography for sub-100 nm lift-off structures |
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| Authors: | Nico Homonnay Nadine GeyerBodo Fuhrmann Hartmut S. Leipner |
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| Affiliation: | a Interdisziplinäres Zentrum für Materialwissenschaften, Martin-Luther-Universität Halle-Wittenberg, Heinrich-Damerow-Str. 4, D-06099 Halle, Germany
b Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle, Germany |
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| Abstract: | We report on the fabrication of hexagonally ordered, sub-wavelength hole arrays (SWHA) by colloidal lithography combined with reactive ion etching and a lift-off process, and their characterization with scanning electron microscopy and ellipsometry. |
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| Keywords: | Colloidal lithography Lift-off Thin films |
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