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掺硼(B)非晶硅(a-Si:H)材料固相晶化(SPC)的研究
引用本文:于振瑞,耿新华,孙云,刘世国,孙钟林,徐温元.掺硼(B)非晶硅(a-Si:H)材料固相晶化(SPC)的研究[J].太阳能学报,1994(2).
作者姓名:于振瑞  耿新华  孙云  刘世国  孙钟林  徐温元
作者单位:南开大学光电子薄膜器件与技术研究所
摘    要:对掺硼(B)材料的固相晶化进行了研究。通过对不同掺B浓度的a-Si:H样品退火前后的X射线衍射、光吸收系数、电导率、激活能及Hall迁移率的测量发现,B原子在固相晶化过程中起晶核作用,晶化后的样品具有较高的迁移率及电导率,同时具有较大的禁带宽度。当接B浓度仅为0.17%时,晶化后样品的电导率为4.35scm-1,迁移率为140cm2V-1s-1,禁带宽度E04=2.16eV。该材料是一种较好的太阳电池窗口材料。

关 键 词:固相晶化,孵化时间,晶核,窗口层

INVESTIGATIONS ON THE SOLID-PHASE CRYSTALLIZATION OF B-DOPED a-Si:H FILMS
Yu Zhen-rui,Geng Xin-hua,Sun Yun,Liu Shi-guo,Sun Zhong-lin,Xu Wen-yuan.INVESTIGATIONS ON THE SOLID-PHASE CRYSTALLIZATION OF B-DOPED a-Si:H FILMS[J].Acta Energiae Solaris Sinica,1994(2).
Authors:Yu Zhen-rui  Geng Xin-hua  Sun Yun  Liu Shi-guo  Sun Zhong-lin  Xu Wen-yuan
Abstract:The effects of B atoms on the solid phase crystallization of PECVD a-Si:H films is investigated by using the X-Ray diffraction,Hall measurements.optical reflection transmission measurements and conductivity measurements.It is found that the B atoms acts as nuclei in the SPC process.The crystallized films have high conductivity and high Hall mobility. The optical band gap of the crystallized films E04=2.16.This figure is larger than that of a-SiC:H window layers.The p-type Poly-Si layers prepared by SPC method is a suitable window material for solar cell.
Keywords:solid phase crystallization  incubation time  nuclei  window layers  
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