| 磁控溅射参数对CNx薄膜成分,化学结合状态和硬度的影响 |
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| 引用本文： | 郑伟涛,丁涛.磁控溅射参数对CNx薄膜成分,化学结合状态和硬度的影响[J].材料科学与工艺,1997,5(1):8-11. |
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| 作者姓名： | 郑伟涛 丁涛 |
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| 作者单位： | 吉林大学材料科学系 |
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| 摘 要： | 应用直流非平衡磁控溅射系统在不同实验条件下制备了ＣＮｘ薄膜材料，其最大氮原子百分含量为３７％，通过傅里叶变换红外光变。Ｘ光光电子能谱以及显微压痕法的测量和分析，对得到的ＣＮｘ薄膜材料中的原子化学结合状态，硬度等性质进行了表征。
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| 关 键 词： | CNx 薄膜 生长 表征 |
The Effects of Experimental Parameters during Magntron Sputter Deposited CN x on Film Composition,Chemical Bonding and Hardness |
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| Zheng Weitao,Ding Tao Li Haibuo Chen Gang,Wang Yiming.The Effects of Experimental Parameters during Magntron Sputter Deposited CN x on Film Composition,Chemical Bonding and Hardness[J].Materials Science and Technology,1997,5(1):8-11. |
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| Authors: | Zheng Weitao Ding Tao Li Haibuo Chen Gang Wang Yiming |
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| Abstract: | CN X thin films were grown using dc unbalanced magnetron sputtering at different experimental conditions.,The maximum of nitrogen concentration in our CN x films is 37 at%.From the measurements and analyses of FTIR. XPS,and manoindentation,the characterization of CN x films has been performed |
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| Keywords: | CN X thim Films Growth Characterization |
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