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Al-Cr-O thin films as an efficient hydrogen barrier |
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| Authors: | Denis Levchuk Max Döbeli Beno Widrig |
| Affiliation: | a Max-Planck-Institut für Plasmaphysik, EURATOM Association, D-85748 Garching, Germany b Ion Beam Physics, Paul Scherrer Institute and ETH Zurich, Schafmattstrasse 20, CH-8093 Zürich, Switzerland c OC Oerlikon Balzers AG, LI-9496 Balzers, Liechtenstein |
| Abstract: | Thin Al-Cr-O films are proposed as hydrogen permeation barriers. Layers of a few microns in thickness are able to suppress hydrogen permeability by a factor of 2000 to 3500 at temperatures of 700 °C, as has been found in our gas phase permeation experiments. We attribute this excellent efficiency to a dense layer morphology and the possible (pre)-formation of solid solutions in corundum-type structure. These films are deposited by pulsed arc evaporation in a batch-type production system at substrate temperatures of 550 °C. |
| Keywords: | Hydrogen Barrier Alumina Solid solution Corundum Fusion |
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