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FeCrVTa0.4W0.4高熵合金氮化物薄膜的微观结构与性能
作者姓名:王子鑫  张勇
作者单位:1.青海大学青海省新型轻合金重点实验室,西宁 810016
基金项目:中央高校基本科研业务费资助项目;区域联合基金资助项目
摘    要:实验利用单靶射频磁控溅射技术,在单晶硅基底上,制备了两个系列FeCrVTa0.4W0.4高熵合金氮化物薄膜,即FeCrVTa0.4W0.4氮化物成分梯度多层薄膜和(FeCrVTa0.4W0.4)Nx单层薄膜,其中,多层薄膜用于太阳光谱选择性吸收薄膜。通过扫描电子显微镜(SEM)、X射线衍射仪(XRD)、纳米力学探针、原子力显微镜(AFM)、紫外?可见分光光度计、接触角测量仪和四探针测试台对FeCrVTa0.4W0.4高熵合金氮化物薄膜进行微观结构分析以及性能表征。结果表明:在不通入氮气时,薄膜为非晶结构,当氮气含量升高后,转变为面心立方固溶体结构;当表层氮气流量为15 mL·min?1时,FeCrVTa0.4W0.4氮化物多层薄膜及单层薄膜均具有最佳的力学性能,其中,多层薄膜的硬度为22.05 GPa,模量为287.4 GPa,单层薄膜的硬度为22.8 GPa,模量为280.7 GPa,随着表层氮气含量的继续增加,力学性能下降;FeCrVTa0.4W0.4氮化物成分梯度多层薄膜在300~800 nm波长范围内均具有太阳光谱选择吸收性,当氮化物薄膜层数较少时具有较好的疏水性;(FeCrVTa0.4W0.4)Nx单层薄膜随着氮气含量的增加,薄膜方块电阻增加。 

关 键 词:高熵合金    磁控溅射    氮化物薄膜    成分梯度    光学性能
收稿时间:2020-09-28

Microstructure and properties of FeCrVTa0.4W0.4 high-entropy alloy nitride films
Authors:WANG Zi-xin  ZHANG Yong
Affiliation:1.Qinghai Provincial Key Laboratory of New Light Alloys, Qinghai University, Xining 810016, China2.State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing 100083, China3.Shunde Graduate School, University of Science and Technology Beijing, Foshan 528399, China
Abstract:Recently, research on high-entropy alloys has developed rapidly. While studying high-entropy alloys in bulk, scholars have also conducted in-depth research on high-entropy alloy films, especially high-entropy alloy nitride films. Compared with traditional binary and ternary nitride films, high-entropy alloy nitride films have a simpler and denser structure and better performance, and therefore have great prospects for application in many fields. Research on high-entropy alloy nitride films is still relatively scarce, and the influencing factors of phase structure transformation and mechanical properties need to be further explored. Therefore, it will be an important research direction in the future. Based on a single-target Radio Frequency (RF) magnetron sputtering technique, two series of FeCrVTa0.4W0.4 high-entropy alloy nitride films were fabricated on monocrystalline silicon substrates. These are FeCrVTa0.4W0.4 nitride composition gradient multilayer films and (FeCrVTa0.4W0.4)Nx single-layer films, in which multilayer films are used for solar spectral selective absorption films. Through scanning electron microscope (SEM), X-ray diffractometer (XRD), nanomechanical probe, atomic force microscopy, UV–visible spectrophotometry, contact angle measuring instrument, and four-probe tester, the microstructure, and properties of FeCrVTa0.4W0.4 high-entropy alloy nitride films were analyzed. The results show that the film is amorphous when nitrogen is not introduced. When nitrogen content increases, nitride films are face-center-cubic solid solution in structure. When the surface nitrogen flow rate is 15 sccm, the FeCrVTa0.4W0.4 nitride multilayer film and the single-layer film have the best mechanical properties. Among them, the hardness of the multilayer film is 22.05 GPa and the modulus is 287.4 GPa; the hardness of the single-layer film is 22.8 GPa, and the modulus is 280.7 GPa. As the nitrogen content on the surface continues to increase, the mechanical properties decrease. FeCrVTa0.4W0.4 nitride composition gradient multilayer films have solar spectrum selective absorptivity in the wavelength range of 300–800 nm and have better hydrophobicity when the number of nitride films layer is small. With increasing nitrogen content, the block resistance of (FeCrVTa0.4W0.4)Nx single-layer film increases. 
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