首页 | 本学科首页   官方微博 | 高级检索  
     

脉冲激光沉积生长单相的Nd_(1.85)Ce_(0.15)CuO_4薄膜及其激光感生热电电压效应
引用本文:熊飞,张辉,张鹏翔,蒋最敏.脉冲激光沉积生长单相的Nd_(1.85)Ce_(0.15)CuO_4薄膜及其激光感生热电电压效应[J].功能材料与器件学报,2009,15(2).
作者姓名:熊飞  张辉  张鹏翔  蒋最敏
作者单位:1. 昆明理工大学光电子新材料研究所,昆明,650051;复旦大学应用表面物理国家重点实验室,上海,200433
2. 昆明理工大学光电子新材料研究所,昆明,650051
3. 复旦大学应用表面物理国家重点实验室,上海,200433
摘    要:采用脉冲激光沉积(PLD)技术,在SrTiO3单晶衬底表面外延生长单相的1.85 Ce0.15 CuO4(NCCO)薄膜,并首次在斜切衬底上生长的NCCO薄膜中探测到激光感生热电电压(LITV)信号.实验研究表明,在低沉积温度、高沉积氧压和较大的激光脉冲重复频率下生长的NCCO薄膜中存在Nd1-xCexO<<1.75>,(NCO)杂相,是由于衬底表面吸附粒子扩散迁移困难所致;而高温下真空退火导致杂相的产生,则与NCCO的结构相变引起的热分解有关.通过提高沉积温度、降低沉积氧压和激光脉冲重复频率、并采用低温(T≤800℃)真空退火的方式,可以抑制杂相的形成.制备得到的单相的NCCO外延薄膜是一种新型的原子层热电堆材料,能量为1mJ的紫外脉冲激光的辐照,可以在倾斜的NCCO薄膜中诱导产生0.8V的LITV信号.

关 键 词:Nd1.85Ce0.15CuO4薄膜  激光感生热电电压效应  脉冲激光沉积  X射线衍射

Preparation of single-phase Nd_(1.85)Ce_(0.15)CuO_4 thin films by pulse laser deposition and the laser-induced thermoelectric voltage effect
XIONG Fei,ZHANG Hui,ZHANG Peng-xiang,JIANG Zui-min.Preparation of single-phase Nd_(1.85)Ce_(0.15)CuO_4 thin films by pulse laser deposition and the laser-induced thermoelectric voltage effect[J].Journal of Functional Materials and Devices,2009,15(2).
Authors:XIONG Fei  ZHANG Hui  ZHANG Peng-xiang  JIANG Zui-min
Affiliation:Institute of Advanced Materials for Photo-electronics;Kunming University of Science and Technology;Kunming 650051;China;2.Surface Physics Laboratory;National Key Laboratory;Fudan University;Shanghai 200433;China
Abstract:The single-phase Nd 1.85 Ce 0.15 CuO 4(NCCO)thin films were deposited epitaxially on SrTiO 3 substrate by pulse laser deposition(PLD).And for the first time,the laser-induced thermoelectric voltage(LITV)signals were detected in the NCCO thin films grown on the vicinal cut substrate.The Nd 1-x CexO 1.75(NCO)impurities were always observed in the NCCO films prepared under the condition of low deposition temperature as well as high oxygen pressure and laser pulse frequency.The difficult mobility of the Absorbe...
Keywords:Nd1  84 Ce0  15 CuO4 films  laser-induce thermoelectric voltage  pulse laser deposition  X-ray diffraction  
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号