三维类摆线轨迹自由曲面抛光的参数优化

工件表面质量受到抛光去除深度模型和抛光轨迹形式的影响,然而对抛光表面质量的研究主要集中这两者其中之一,因此寻找两者参数的最优组合有重要意义。选择非回转的自由曲面作为加工工件生成自由曲面的恒半径步距三维类摆线轨迹,再以传统表面粗糙度参数Sa和表面纹理纵横比Str为指标,通过设计合理的Taguchi正交试验以及设置去除深度模型参数和轨迹参数的试验水平,分析各参数对表面质量影响程度的大小,得出一组基于试验水平的最优抛光参数组合,并进行最优组合的试验验证。试验结果表明:在各抛光去除深度模型参数和摆线轨迹参数中,对表面质量影响程度大小依次为:倾角α、接触变形e、进给速度F、摆线半径r、摆线步距s;经最优参数组合抛光的自由曲面Sa值为0.19μm,Str值为0.50,结果均优于正交试验各组结果,寻找最优组合的方法快速有效。

Polishing Parameters Optimization for Free form Surface Based on Cycloid Trajectory

Both the polishing material removal model and the polishing trajectory have significant effect on the surface quality,but present researches mainly focus on either of them.Hence,finding out an optimal combination of parameters is significant for improving surface quality.Cycloid polishing trajectory based on material removal model of flexible polishing pad on non-rotationally free-form surfaces was generated.Then the Taguchi experiments and reasonable test levels were designed where the surface roughness(Sa)and the surface texture aspect ratio(Str)of the polished surface were served as the indexes.The influence of each parameter on the surface quality was analyzed and a set of optimal combination of polishing parameters based on the test level was obtained.The results show that the dominant factor is tilt angle,then followed by contact deformation,feed speed,cycloid radius and cycloid step.The S a and S tr of the optimal parameters are 0.19μm and 0.50 respectively,which are better than all the trial results of Taguchi experiments.