Low-temperature atomic layer deposition of Al2O3 thin coatings for corrosion protection of steel: Surface and electrochemical analysis |
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Authors: | Belén Díaz Emma Härkönen Jolanta ?wiatowska Vincent Maurice Antoine Seyeux Philippe Marcus Mikko Ritala |
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Affiliation: | aLaboratoire de Physico-Chimie des Surfaces, CNRS (UMR 7045) – Chimie-ParisTech (ENSCP), 11 rue Pierre et Marie Curie, F-75005 Paris, France;bLaboratory of Inorganic Chemistry, University of Helsinki, P.O. Box 55, FIN-00014 Helsinki, Finland |
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Abstract: | ToF-SIMS, XPS, voltammetry and EIS investigation of the anti-corrosion properties of thin (10, 50 and 100 nm) alumina coatings grown by atomic layer deposition at 160 °C on steel is reported. Surface analysis shows a thickness-independent Al2O3 stoichiometry of the coating and trace contamination by the growth precursors. The buried coating/alloy interface has iron oxide formed in ambient air and/or resulting from the growth of spurious traces in the initial stages of deposition. Electrochemical analysis yields an exponential decay of the coating porosity over four orders of magnitude with increasing thickness, achieved by sealing of the more defective first deposited 10 nm. |
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Keywords: | A Steel B EIS B XPS B SIMS C Oxide coatings |
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