| 直流磁控反应溅射沉积ITO透明导电膜的研究 |
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| 引用本文： | 茅昕辉 陈国平. 直流磁控反应溅射沉积ITO透明导电膜的研究[J]. 光电子技术, 1995, 15(1): 72-78 |
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| 作者姓名： | 茅昕辉 陈国平 |
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| 作者单位： | 东南大学薄膜研究所!210096 |
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| 摘 要： | 研究了用铟锡合金靶直流磁控反应溅射制备ＩＴＯ透明导电膜。介绍了膜的制备工艺和膜的特性，讨论了成膜过程和热处理对膜的电阻率和透光率的影响。
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| 关 键 词： | ITO膜 透明导电膜 磁控反应溅射 |
Study of ITO Transparent Conducting Thin Films Deposited by DC Magnetron Reactive Sputtering |
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| Mao Xinhui, Chen Guoping, Chen Gongnai Zhang Suixin, Zhang Xuping. Study of ITO Transparent Conducting Thin Films Deposited by DC Magnetron Reactive Sputtering[J]. Optoelectronic Technology, 1995, 15(1): 72-78 |
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| Authors: | Mao Xinhui Chen Guoping Chen Gongnai Zhang Suixin Zhang Xuping |
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| Abstract: | ITO transparent conducting films deposited by DC magnetron reactive sputtering from In-Sn alloy target were Studied. The process and properties of ITO films are described. The effects of depositing and annealing parameters on transmission of films are discussed as well. |
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| Keywords: | ITO films transparent conducting films DC magnetron reactive sputtering |
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