| 光学多层膜减小电场强度的一种新设计方法 |
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| 引用本文： | 孔明东. 光学多层膜减小电场强度的一种新设计方法[J]. 光电工程, 1999, 26(1): 55-59 |
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| 作者姓名： | 孔明东 |
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| 作者单位： | 成都精密光学工程研究中心 |
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| 摘 要： | 制作 损伤阈值光学薄膜不仅需要沉积工艺有所突破，而且需要膜系设计也有所改进，用于减少强激光对薄膜的损伤因素。本文提出了一种计算机算法用于改善光学多层膜内驻波场分布，肖弱电场强度对薄膜的损伤。其物理概念清清晰，理论推导，算法编程实用简单。
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| 关 键 词： | 电场强度 抗激光薄膜 激光损伤 薄膜 设计 |
A New Design Method for Reducing Electric Field Intensity in Optical Multi Layer Film |
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| Kong Mingdong. A New Design Method for Reducing Electric Field Intensity in Optical Multi Layer Film[J]. Opto-Electronic Engineering, 1999, 26(1): 55-59 |
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| Authors: | Kong Mingdong |
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| Abstract: | In manufacturing of high damage threshold optical thin film,not only a breakthrough is needed in
depositing technology,but also some improvements in films design for reducing the damage
factors of high energy laser on thin film are needed.A computer algorithm used for improving the
distribution of station wave field and reducing the damage of electric field on optical multi layer
film is put forward in the paper.Its physical concept is clear,theoretical derivation and the
implementation of algorithm programming are simple. |
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| Keywords: | Electric field strength Antilaser
films Laser damage. |
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