Effect of sputtering power on optical properties of prepared TiO2 thin films by thermal oxidation of sputtered Ti layers |
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| Affiliation: | 1. Physics Department, Faculty of Science, University of Kurdistan, 66177-15175 Sanandaj, Iran;2. Research Center for Nanotechnology, University of Kurdistan, 66177-15175 Sanandaj, Iran;3. Physics Department, Faculty of Science, Razi University, Kermanshah, Iran;1. Centre for Micro and Nano Devices, Department of Physics, Park Road Campus, COMSATS Institute of Information Technology, Islamabad 44000, Pakistan;2. CNR-IOM, Laboratorio TASC, StradaStatale 14, Km.163.5 I-34149, Trieste, Italy;1. Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing, 100044, China;2. School of Science, Beijing Jiaotong University, Beijing, 100044, China;1. Laboratory of Semi-conductors, Nano-structures and Advanced Technologies, Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95, 2050 Hammam-Lif, Tunisia;2. Photovoltaic Laboratory, Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95, 2050 Hammam-Lif, Tunisia;3. Faculty of science of Bizerte, University of Carthage, 7021 Zarzouna, Tunisia;1. Department of Physics, Faculty of Science, Razi University, Kermanshah, Iran;2. Nanoscience and Nanotechnology Research Centre, Razi University, Kermanshah, Iran;3. Department of Physics, Faculty of Science, University of Kurdistan, Sanandaj, Iran;1. ENEA-Italian National Agency for New Technologies, Energy and Sustainable Economic Development, Energy Technology Department, Casaccia Research Centre, Via Anguillarese 301, 00123 Roma, Italy;2. Department of Science Teaching, Faculty of K. K. Education, Atatürk University, 25240 Erzurum, Turkey;3. Advanced Materials Research Laboratory, Department of Nanoscience and Nanoengineering, Graduate School of Natural and Applied Sciences, Ataturk University, 25240 Erzurum, Turkey;4. Department of Elect. & Elect. Engn., Faculty of Engineering, Ardahan University, 75000 Ardahan, Turkey;5. Department of Alternative Energy Sources, Vocational High School, Erzincan University, 24000 Erzincan, Turkey;1. UM Power Energy Dedicated Advanced Centre (UMPEDAC), Level 4, Wisma R&D UM, University of Malaya, Jalan Pantai Baharu, 59990 Kuala Lumpur, Malaysia;2. Department of Materials Science and Engineering, Institute of Space Technology (IST), Islamabad 44000, Pakistan;3. Department of Metallurgy and Materials Engineering (DMME), Pakistan Institute of Engineering and Applied Sciences (PIEAS), Islamabad 45650, Pakistan;4. Materials Division, PINSTECH, P.O. Nilore, Islamabad, Pakistan;5. Department of Mechanical Engineering, Quaid-e-Awam University of Engineering, Science and Technology, Nawabshah 67480, Sindh, Pakistan |
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| Abstract: | In this research, TiO2 thin films prepared via thermal oxidation of Ti layers were deposited by RF-magnetron sputtering method at three different sputtering powers. The effects of sputtering power on structure, surface and optical properties of TiO2 thin films grown on glass substrate were studied by X-ray diffraction (XRD), atomic force microscopic (AFM) and UV–visible spectrophotometer. The results reveal that, the structure of layers is changed from amorphous to crystalline at anatase phase by thermal oxidation of deposited Ti layers and rutile phase is formed when sputtering power is increased. The optical parameters: absorption coefficient, dielectric constants, extinction coefficient, refractive index, optical conductivity and dissipation factor are decreased with increase in sputtering power, but increase in optical band gap is observed. The roughness of thin films surface is affected by changes in sputtering power which is obtained by AFM images. |
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| Keywords: | Thin film RF-sputtering Thermal oxidation Optical properties |
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