Al/Ni和Al/Ti纳米多层薄膜制备与表征

用磁控溅射法制备了Al/Ni、Al/Ti纳米多层薄膜。用场发射扫描电子显微镜(FESEM)、原子力显微镜(AFM)和X-射线衍射仪(XRD)对其进行了结构表征和成分分析。用差示扫描量热法(DSC)测定了纳米多层薄膜的反应放热量。结果表明: 工作压力为0.4 Pa,Al、Ni、Ti溅射功率分别为200,220,180 W条件下制备的Al/Ni、Al/Ti多层薄膜表面均匀致密,无尖锐峰,层状结构分明,组成成分分别为Al、Ni和Al、Ti单质状态; Al/Ni、Al/Ti多层薄膜放热量分别为1134.64,918.36 J·g-1,达到理论值的82.2%, 80.7%。

Fabrication and Characterization of Al/Ni and Al/Ti Multilayer Nanofilms

Al/Ni and Al/Ti multilayer nanofilms were prepared by magnetron sputtering method. Field emission scanning electron microscope (FESEM), atomic force microscopy (AFM) and X-ray diffraction (XRD) were used to characterize the deposited films and analyze the components. The heat released in the alloying reaction was measured by differential scanning calorimetry (DSC).The results show that the samples obtained at 0.4 Pa with sputtering power of 200 W for Al, 220 W for Ni and 180 W for Ti, are uniform and its layered structures are clearly visible. The deposited Al/Ni multilayer nanofilms consist of aluminium and nickel. The Al/Ti multilayer nanofilms consist of aluminium and titanium. The heat released in Al/Ni and Al/Ti multilayer nanofilms is 1134.64, 918.36 J·g^-1, which reach to 82.2%, 80.7% of theoretical values, respectively.