| 双面PSD器件的工艺研究 |
| |
| 引用本文： | 汪继芳,刘善喜,简崇玺.双面PSD器件的工艺研究[J].电子工艺技术,2012,33(2):93-95,109. |
| |
| 作者姓名： | 汪继芳 刘善喜 简崇玺 |
| |
| 作者单位： | 华东光电集成器件研究所,安徽蚌埠,233042 |
| |
| 摘 要： | 双面PSD器件具有很高的灵敏度、良好的瞬态响应特性、紧密的结构以及简单的处理电路等优点。介绍了PSD器件的制作技术。重点介绍了利用微细加工技术进行双面两侧分流电极型PSD的制作,解决了双面对准光刻技术的工艺难题,为双面高精度PSD器件的制作提供了一条工艺技术途径。
|
| 关 键 词： | 双面PSD 双面光刻 氧化 扩散 |
Research of Double-side PSD Technology |
| |
| WANG Ji-fang,LIU Shan-xi,JIAN Chong-xi.Research of Double-side PSD Technology[J].Electronics Process Technology,2012,33(2):93-95,109. |
| |
| Authors: | WANG Ji-fang LIU Shan-xi JIAN Chong-xi |
| |
| Affiliation: | (East China Institute of Optoelectronic Integrated Devices, Bengbu 233042, China) |
| |
| Abstract: | Double-side PSD is of high sensitivity, good characteristics in transient response, compact structure and a simple circuit. Introduce the production technology of double-sided PSD device, emphasize on double-side lithography technology. Solve some problems of double-side alignment lithography process. A double side PSD device with high precision has been fabricated. |
| |
| Keywords: | Double-side PSD Double-side lithography Oxidation Diffusion |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
