| 聚焦离子束(FIB)刻蚀在光电子器件方面的应用 |
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| 引用本文： | 毕建华,陆家和.聚焦离子束(FIB)刻蚀在光电子器件方面的应用[J].真空科学与技术学报,1994(4). |
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| 作者姓名： | 毕建华 陆家和 |
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| 作者单位： | 清华大学电子工程系!北京100084 |
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| 摘 要： | 聚焦离子束无掩模微细加工技术逐渐引起人们的兴趣，它包括聚焦离子束无掩模刻蚀、注入、往积、光刻等。聚焦离子束刻蚀能在半导体激光器材料上加工得到具有光学精度的表面。首先论述聚焦离子束刻蚀的特点，然后概括说明目前它在光电子器件方面的若干应用。
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| 关 键 词： | 聚焦离子束 无掩模刻蚀 光电子器件 |
THE APPLICATION OF FOCUSED ION BEAM ETCHING TO OPTOELECTRONIC DEVICES |
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| Bi Jianhua, Lu Jiahe.THE APPLICATION OF FOCUSED ION BEAM ETCHING TO OPTOELECTRONIC DEVICES[J].JOurnal of Vacuum Science and Technology,1994(4). |
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| Authors: | Bi Jianhua Lu Jiahe |
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| Abstract: | There has been an increasing interest in focused ion beam maskless microfabrication technology It includes focused ion beam maskless etching, implantation deposition lithography etc Focused,lithography, ect Focused ion bearm teching is capable of forming optical quality surfaces in semiconductor laser materials This paper describes the characteristics of focused ion beam the and reviews some of the recoent application of focused ion beam etching to optoelectronic devices. |
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| Keywords: | Focused ion beam (FIB) Maskless etching Optoelectronic device |
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