| 精密掩模清洗及保护膜安装工艺 |
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| 引用本文： | 赵延峰.精密掩模清洗及保护膜安装工艺[J].半导体技术,2008,33(2):151-154. |
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| 作者姓名： | 赵延峰 |
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| 作者单位： | 无锡华润微电子有限公司,掩模工厂,无锡,214061 |
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| 摘 要： | 光刻工艺及其成品率对掩模洁净度要求极高.通过一系列研究分析,找到了传统掩模清洗工艺的一些缺点和局限性,借鉴和参考了传统掩模清洗工艺,克服了其局限性.基于精密掩模对加工质量的高要求,安装了保护膜并改进了精密掩模清洗工艺,通过试验形成了最终工艺.新清洗工艺的开发满足了0.5μm掩模加工洁净度要求.
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| 关 键 词： | 掩模 清洗工艺 保护膜 |
| 文章编号： | 1003-353X（2008）02-0151-04 |
| 收稿时间： | 2007-10-11 |
| 修稿时间： | 2007年10月11 |
Cleaning Technology of Precision Mask and Pellicle Mounting |
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| ZHAO Yanfeng.Cleaning Technology of Precision Mask and Pellicle Mounting[J].Semiconductor Technology,2008,33(2):151-154. |
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| Authors: | ZHAO Yanfeng |
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| Affiliation: | ZHAO Yanfeng (Mask Factory,Wuxi China Resources Microelectronics Co.,Ltd.,Wuxi 214061,China) |
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| Abstract: | Lithography process and its yield require high cleanliness on the mask.Through a series of researches and analysis,the weaknesses and limitations of the traditional mask cleaning technology were found.The limitations were overcome by referring to the traditional mask cleaning technology.Based on the high requirements of precision mask processing on quality,the pellicle mount was done and the precision cleaning process was improved,final process was completed with experiments.The development of the new proce... |
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| Keywords: | mask cleaning process pellicle |
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