| 用电子束工艺反转制造1:1精密掩模的工艺技术研究 |
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| 引用本文： | 赵丽新. 用电子束工艺反转制造1:1精密掩模的工艺技术研究[J]. 微电子技术, 1999, 0(4) |
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| 作者姓名： | 赵丽新 |
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| 作者单位： | 中国华晶电子集团公司掩模工厂!无锡,214061 |
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| 摘 要： | 本文主要描述了用电子束工艺反转技术制造1：1精密掩模的新方法,给出了从基本原理入手来确定工艺流程和选定工艺条件的过程,并给出制作实例说明了该项技术所取得的经济效益和社会效益。
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| 关 键 词： | 工艺反转技术 精密掩模 正胶工艺 |
Study on Technology of Making 1:1 Precise Mask by the technology of EB-Process Reverse |
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| Zao Lixin. Study on Technology of Making 1:1 Precise Mask by the technology of EB-Process Reverse[J]. Microelectronic Technology, 1999, 0(4) |
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| Authors: | Zao Lixin |
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| Abstract: | This article mainly described the method of making 1: 1 precise rnask by thetechnology of EB - Process reveme. It offered the process coaree and the process specifica-tion setting up by fundamental. Furthermore, if presented the examle that give expressionto the benefits of economy and public we could obtain from this technology. |
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| Keywords: | Process reverse techniques Precise mask Positive photoresist techniques |
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