Ni-Al-V合金DO22相间有序畴界面的微观相场模拟

利用微观相场动力学模型模拟Ni-A1-V合金沉淀过程中DO22(Ni3V)相沿100]和001]方向形成的有序畴界面,对界面结构及其界面处合金元素的成分进行了研究.结果表明:DO22相沿100]和00l]方向形成3种稳定界面,且都不可以迁移;界面性质与界面结构有关,(002)//(100)界面处易析出上J12相,主要存在于沉淀早期;(002)//(100)·1/2100]界面在沉淀后期易形成一种过渡界面;{110}孪晶界面则是三类界面中相对常见和稳定的界面;合金元素在不同的界面处有不同的偏聚和贫化倾向,在所有的界面处V原子贫化而Ni原子偏聚,Al原子在(002)//(100)·1/2100]界面处贫化,在其它界面处偏聚,且各元素在不同的界面处偏聚以及贫化程度也不一样.

Simulation of Ordered Domain Interfaces Formed between DO22 Phases in Ni-Al-V Alloy Using Microscopic Phase-Field Model

Microscopic phase-field model was used to simulate the ordered domain interfaces formed between DO22 (Ni3V) phases along 100] and 001] direction in Ni-Al-V alloy. The atomic structure of the interface and the composition of alloying elements at the interfaces were investigated using the occupation probability of atoms. The results show that there are three kinds of stable interfaces formed between DO22 phases (Ni3V) along 100] and 001] direction, and all of them can not migrate. The property of interfac...