| 铝膜穿透性阳极氧化技术 |
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| 引用本文： | 王立春.铝膜穿透性阳极氧化技术[J].电子元件与材料,2000,19(5):5-6. |
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| 作者姓名： | 王立春 |
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| 作者单位： | 信息产业部电子第43研究所,安徽,合肥,230031 |
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| 摘 要： | 铝膜穿透性阳极氧化是实现阳极氧化铝薄膜多层布线基板制作的关键技术。研究了电流密度、电解质溶液温度和铝膜厚度对氧化时间的影响。绝缘电阻测定及扫描电子显微镜分析的结果证实了采用穿透性阳极氧化技术制作导带 ,导带间不存在残余铝薄膜。
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| 关 键 词： | 多层布线 阳极氧化 恒流期 衰减期 |
Technology for thoroughly anodizing aluminum film |
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| WANG Li-chun.Technology for thoroughly anodizing aluminum film[J].Electronic Components & Materials,2000,19(5):5-6. |
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| Authors: | WANG Li-chun |
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| Abstract: | In Chinese. Technology for t horoughly anodizing aluminum film is very important for manufacturing multilayer interconnection substrates.The effects of current density,electrolyte temperat ure and aluminum film thickness on anodization time are investigated.The result s of insulation resistance measurement and SEM analysis show that bythis technol ogy,aluminum film between conductors can be theroughly anodized.(4 refs.) |
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| Keywords: | multilayer interconnction anodization constant cu rrent period decay perred |
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