Approach to Weaken Auto doping Effect in Si CVD Epitaxy by Compensation in Opposite Direction |
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| Authors: | Liu Yuling Jin Jie and Xu XiaohuiHebei University of Technology Tianjin China |
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| Affiliation: | Liu Yuling,Jin Jie and Xu XiaohuiHebei University of Technology,Tianjin 300130,China |
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| Abstract: | The mechanism of auto doping was discussed. The technological optimization and technical simplification for adsorption desorption, steady dynamic transformation were conducted with compensation in opposite direction. In many cases the auto doping could be controlled effectively. |
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| Keywords: | Silicon CVD Epitaxy Auto doping |
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