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电化学沉积法制备氧化锌薄膜及性能研究
引用本文:丁尧,武光明,高德文,周洋,殷天兰. 电化学沉积法制备氧化锌薄膜及性能研究[J]. 纳米科技, 2012, 0(5): 71-75
作者姓名:丁尧  武光明  高德文  周洋  殷天兰
作者单位:北京石油化工学院,北京102617
摘    要:
以硝酸锌为原料,CTAB和硝酸钾为电沉积添加剂,以导电石墨板为对电极,采用方波电位沉积的方法在氧化锡铟(ITO)导电玻璃基底上制备出透明的ZnO薄膜,采用X射线衍射、原子力显微镜和光学透过谱等技术对不同沉积条件下薄膜的结晶特性、表面形貌、光学性质等进行了研究,结果表明,应用方波电位法制备氧化锌薄膜的优化条件为:沉积时间6min、Zn(N03)2、浓度0.05mol/L、沉积温度为80℃、退火温度500℃。制备的ZnO薄膜在可见光范围内的平均透光率〉85%,且表面平整度高,晶粒尺寸较小。

关 键 词:氧化锌薄膜  电化学  方波电位沉积

Fabrication of ZnO thin Films by Electrochemical Deposition and Research on its Properties
DING Yao,WU Guang-ming,GAO De-wen,ZHOU Yang,YIN Tian-lan. Fabrication of ZnO thin Films by Electrochemical Deposition and Research on its Properties[J]. , 2012, 0(5): 71-75
Authors:DING Yao  WU Guang-ming  GAO De-wen  ZHOU Yang  YIN Tian-lan
Affiliation:(Beijing Institute of Petrochemical Technology, Beijing 102617, China)
Abstract:
The transparent ZnO films were deposited on the indium tin oxide (ITO) coated glass substrates by using the deposition of square wave potential deposition, the conductive graphite plate was used to be counter electrode, electrolyte consisted of zinc nitrate and electrodeposition additives, which was made up of CTAB and potassium nitrate. Researched crystalline characteristics, surface morphology, optical properties of thin film under different deposition conditions by X- ray diffractometer, atomic force microscope and UV-vis spectrophotometer.The results show that: the optimal conditions for fabricating ZnO thin Fihns by square wave potential method describe as follows the deposition time was 6min, concentration of zinc nitrate was 0.05mol/L,temperature of deposition was 80℃, the annealing temperature was 500℃. The average optical transmittance in the visible range is greater than 85%.And surface flatness is high, grain size is small.
Keywords:ZnO thin film  electrochemistry  square wave potential deposition
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