| 脉冲激光沉积法制备ZrW_2O_8薄膜(英文) |
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| 引用本文： | 刘红飞,程晓农,张志萍.脉冲激光沉积法制备ZrW_2O_8薄膜(英文)[J].硅酸盐学报,2009,37(5). |
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| 作者姓名： | 刘红飞 程晓农 张志萍 |
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| 作者单位： | 1. 江苏大学材料科学与工程学院,江苏,镇江,212013
2. 江苏大学材料科学与工程学院,江苏,镇江,212013;江海学院,江苏,扬州,215101 |
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| 基金项目： | 国家自然科学基金，江苏省高校自然科学重大基础研究项目，江苏大学博上创新基金 |
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| 摘 要： | 采用纯ZrW2O8陶瓷靶材,以脉冲激光沉积法在石英基片上沉积并退火处理后制备了ZrW2O8薄膜.利用X射线衍射仪、X射线光电子能谱 仪和扫描电子显微镜观察和确定r薄膜结构、化学组分和表面形貌,用划痕仪、表面粗糙轮廓仪测量了薄膜与基片之间的结合力和薄膜厚度.结果表明:脉冲激光沉积的薄膜为非晶态,膜层物质各元素之间的化学计量比与靶材成分一致;衬底未加热沉积的薄膜表而粗糙度较大,衬底温度为650℃ 时,薄膜表面平滑致密,粗糙度明显降低:非晶膜在1200℃密闭退火热处理3 min后淬火得到立方相ZrW2O8薄膜,退火后的薄膜品粒较大,同时 还出现一些沿晶界和晶内的裂纹缺陷.随着退火温度升高,薄膜与基片的结合力降低.
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| 关 键 词： | 钨酸锆 薄膜 脉冲激光沉积 |
GROWTH OF ZrW_2O_8 THIN FILMS BY PULSED LASER DEPOSITION |
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| LIU Hongfei,CHENG Xiaonong,ZHANG Zhiping.GROWTH OF ZrW_2O_8 THIN FILMS BY PULSED LASER DEPOSITION[J].Journal of The Chinese Ceramic Society,2009,37(5). |
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| Authors: | LIU Hongfei CHENG Xiaonong ZHANG Zhiping |
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| Affiliation: | 1.School of Materials Science and Engineering;Jiangsu University;Zhenjiang 212013;2.Jianghai College;Yangzhou 225101;Jiangsu;China |
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| Abstract: | ZrW2O8 thin films were deposited on quartz substrates by pulsed laser deposition using a ZrW2O8 ceramic target and with subsequent annealing.The microstructure,chemical composition and morphology of the ZrW2O8 thin films were observed and determined by X-ray diffraction,X-ray photoelectron spectroscopy and scanning electron microscopy,and the thickness and cohesion of the films were measured by a surface profilometer and a scratching adhesion tester respectively.The results indicate that the as-deposited Zr... |
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| Keywords: | zirconium tungstate thin film pulsed laser depositing |
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