A 3.3-V single power supply 16-Mb nonvolatile virtual DRAM using aNAND flash memory technology |
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Authors: | Tae-Sung Jung Do-Chan Choi Sung-Hee Cho Myong-Jae Kim Seung-Keun Lee Byung-Soon Choi Jin-Sun Yum San-Hong Kim Dong-Gi Lee Jong-Chang Son Myung-Sik Yong Heung-Kwun Oh Sung-Bu Jun Woung-Moo Lee Haq E. Kang-Deog Suh Ali S.B. Hyung-Kyu Lim |
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Affiliation: | DRAM Design, Samsung Electron. Co. Ltd., Kyungki-Do; |
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Abstract: | A 3.3-V 16-Mb nonvolatile memory having operation virtually identical to DRAM with package pin compatibility has been developed. Read and write operations are fully DRAM compatible except for a longer RAS precharge time after write. Fast random access time of 63 ns with the NAND flash memory cell is achieved by using a hierarchical row decoder scheme and a unique folded bit-line architecture which also allows bit-by-bit program verify and inhibit operation. Fast page mode with a column address access time of 21 ns is achieved by sensing and latching 4 k cells simultaneously. To allow byte alterability, nonvolatile restore operation with self-contained erase is developed. Self-contained erase is word-line based, and increased cell disturb due to the word-line based erase is relaxed by adding a boosted bit-line scheme to a conventional self-boosting technique. The device is fabricated in a 0.5-μm triple-well, p-substrate CMOS process using two-metal and three-poly interconnect layers. A resulting die size is 86.6 mm2, and the effective cell size including the overhead of string select transistors is 2.0 μm2 |
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