Influence of Al co-deposition on the crystal growth of Co-based Heusler-compound thin films on Si(111)期刊界 All Journals 搜尽天下杂志传播学术成果专业期刊搜索期刊信息化学术搜索

Influence of Al co-deposition on the crystal growth of Co-based Heusler-compound thin films on Si(111)

Authors:	Soichiro OkiShinya Yamada Tatsuhiko MurakamiMasanobu Miyao Kohei Hamaya

Affiliation:	^a Department of Electronics, Kyushu University, 744 Motooka, Fukuoka, 819-0395, Japan ^b CREST, Japan and Science Technology, Sanbancho, Tokyo, 102-0075, Japan ^c PRESTO, Japan and Science Technology, Sanbancho, Tokyo, 102-0075, Japan

Abstract:

Keywords:	Spintronics Co-based Heusler compound LTMBE
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