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离子束辅助沉积制备高功率激光薄膜的研究
引用本文:张大伟,贺洪波,邵建达,范正修.离子束辅助沉积制备高功率激光薄膜的研究[J].激光技术,2008,32(1):57-60.
作者姓名:张大伟  贺洪波  邵建达  范正修
作者单位:1.上海理工大学, 光学与电子工程学院, 上海, 200093;
摘    要:综述了离子束辅助沉积技术在高功率激光薄膜制备中的应用研究进展.指出该技术在制备高激光损伤阈值的薄膜中存在的问题,即出现过高的堆积密度,会给薄膜带来杂质缺陷、化学计量比缺陷、损伤缺陷、晶界缺陷,制备薄膜的残余应力存在着压应力增加的趋势,会改变薄膜的晶体结构等.并指出了该研究领域的研究方向.

关 键 词:薄膜    离子束辅助沉积    高功率激光薄膜    激光损伤阈值
文章编号:1001-3806(2008)01-0057-04
收稿时间:2006-10-20
修稿时间:2007-01-17

Preparation of high power laser films based on ion beam assisted deposition
ZHANG Da-wei,HE Hong-bo,SHAO Jian-da,FAN Zheng-xiu.Preparation of high power laser films based on ion beam assisted deposition[J].Laser Technology,2008,32(1):57-60.
Authors:ZHANG Da-wei  HE Hong-bo  SHAO Jian-da  FAN Zheng-xiu
Abstract:The progress in the application of ion beam assisted deposition on the preparation of high laser films was reviewed. Some key problems of this project were analyzed such as too high packing density, new defects introduced by ions, increased compressive stress etc. , and some ways of this project for the future were presented.
Keywords:thin films  ion beam assisted deposition  high power laser films  laser induced damage threshold
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