| 基于同步辐射光刻的多层微纳结构制造 |
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| 引用本文： | 李以贵,杉山进. 基于同步辐射光刻的多层微纳结构制造[J]. 纳米技术与精密工程, 2009, 7(2): 186-189 |
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| 作者姓名： | 李以贵 杉山进 |
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| 作者单位： | 上海交通大学薄膜与微细技术教育部重点实验室,上海,200240;上海交通大学微米/纳米加工技术国家级重点实验室,上海,200240;日本立命馆大学微系统系,京都,525-8577 |
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| 摘 要： | 高分子材料,如甲基丙烯酸甲酯（polymethyl methacrylate,PMMA）,由于其价格相对低廉和容易加工,在集成电路和MEMS研究中受到广泛的关注．本文提出了一种基于PMMA基板的多层同步辐射光刻技术,用于制作微驱动器等有移动部件的设备．设计的多层结构包括140个单元的叉指平行电容器,每个电容器的间隔是2μm,最小尺寸是4μm,厚度是200μm,故深宽比达到50：1．该制造方法具有高深宽比、高产出率及成本低等优点．
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| 关 键 词： | 多层微纳制造 同步辐射光刻 对准工具 |
Multi-Layer Micro/Nano Fabrication Based on Synchron Radiation Lithography |
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| LI Yi-gui,SUGIYAMA Susumu. Multi-Layer Micro/Nano Fabrication Based on Synchron Radiation Lithography[J]. Nanotechnology and Precision Engineering, 2009, 7(2): 186-189 |
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| Authors: | LI Yi-gui SUGIYAMA Susumu |
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| Affiliation: | 1. Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education;Shanghai Jiaotong University;Shanghai 200240;China;2. National Key Laboratory of Micro/Nano Fabrication Technology;3. Department of Microsystems;Ritsumeikan University;Kusatsu/Shiga 525-8577;Japan |
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| Abstract: | Polymer materials,such as polymethyl methacrylate(PMMA),have attracted great interests in the research and development of integrated circuits(IC)and micro-electro-mechanical systems(MEMS) due to their relatively low cost and easy process. In this paper,we fabricated a PMMA-based multi-layer micro/nano structure by X-ray synchron radiation lithography,which serves for some devices with moving parts such as micro actuators. The designed multi-layer micro structure consists of 140 units of interdigitated paral... |
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| Keywords: | multi-layermiero/nanofabrication synchron radiation lithography alignment tool |
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