| Structure and Tribology Property of Carbon Nitride Films Deposited by MW-ECR Plasma Enhanced Unbalanced Magnetron Sputtering |
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| 引用本文： | 高鹏 徐军 朴勇 丁万昱 邓新绿 董闯. Structure and Tribology Property of Carbon Nitride Films Deposited by MW-ECR Plasma Enhanced Unbalanced Magnetron Sputtering[J]. 等离子体科学和技术, 2006, 8(4): 425-428 |
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| 作者姓名： | 高鹏 徐军 朴勇 丁万昱 邓新绿 董闯 |
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| 作者单位： | [1]State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China [2]International Centre for Materials Physics, Chinese Academy of Sciences, Shenyang 110016, China |
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| 基金项目： | supported by National Natural Science Foundation of China （No. 50390060） |
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| 摘 要： | Carbon nitride films were deposited by a twinned microwave electron cyclotron resonance （ECR） plasma source enhanced unbalanced magnetron sputtering system. The results indicate that the structure of the films is sensitive to the nitrogen content. The increase in the nitrogen flow ratio leads to an increase in the sp3 content and an improvement of the tribological properties.
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| 关 键 词： | 不均衡磁控管溅射法 碳氮化物薄膜 结构 摩擦性能 等离子体 |
| 收稿时间： | 2005-09-12 |
| 修稿时间： | 2005-09-12 |
Structure and Tribology Property of Carbon Nitride Films Deposited by MW-ECR Plasma Enhanced Unbalanced Magnetron Sputtering |
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| GAO Peng, XU Jun, PIAO Yong, DING Wanyu, DENG Xinlu, DONG Chuang. Structure and Tribology Property of Carbon Nitride Films Deposited by MW-ECR Plasma Enhanced Unbalanced Magnetron Sputtering[J]. Plasma Science & Technology, 2006, 8(4): 425-428 |
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| Authors: | GAO Peng XU Jun PIAO Yong DING Wanyu DENG Xinlu DONG Chuang |
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| Affiliation: | 1 State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China International Centre for Materials Physics, Chinese Academy of Sciences, Shenyang 110016, China |
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| Abstract: | |
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| Keywords: | carbon nitride tribological property unbalanced magnetron sputtering |
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