Low resistance contacts to p-type cadmium telluride |
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Authors: | Thomas C. Anthony Alan L Fahrenbruch Richard H. Bube |
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Affiliation: | (1) Department of Materials Science and Engineering, Stanford University, 94305 Stanford, California |
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Abstract: | A survey of metal contacts to p-type CdTe has revealed that the best contact is one prepared by vacuum deposition of CuAu
onto a surface that has been etched with K2Cr2O7:H2SO4 . The contact resistivity on 0.5 ohm-cm p-type CdTe is between 0.1 and 0.5 ohm-cm2 . The contact resistivity does increase if subjected to heat treatment, but is stable in air at room temperature for at least
several months. Contacts of CuAu and Au on a chromate etched surface were compared in detail with similar metal contacts on
a methanol-bromine etched surface through measurements of current vs. voltage as a function of temperature, photovoltaic response,
and Auger analysis. CuAu contacts on a chromate etched surface are describable in terms of a thermally assisted tunneling
model with a barrier height of about 0.60 eV. Au contacts on either a chromate etched or a methanol-bromine etched surface
can be described equally well by a thermally assisted tunneling model or by a thermionic emission model. In either case the
barrier height is about 0.1 eV larger on the methanol-bromine etched surface than on the chromate etched surface. Auger analysis
indicates that chromate etching produces a tellurium rich surface that plays a key role in determining subsequent contact
properties. |
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Keywords: | Contacts p-CdTe Tunneling |
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