| 利用材料发射率来确定玻璃高真空系统的烘烤温度 |
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| 引用本文： | 孙筱云,朱云,裘国红.利用材料发射率来确定玻璃高真空系统的烘烤温度[J].中国计量学院学报,1994(2). |
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| 作者姓名： | 孙筱云 朱云 裘国红 |
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| 摘 要： | 在高真空系统中，真空室的烘烤温度对获得要求的真空氛围有着重要的影响，对于玻璃制作的真空系统，目前对于该温度的确定缺少一种较为简单易行的方法，本文基于辐射换热分析提出了具有通用性的利用材料表面辐射率来计算玻璃表面烘烤温度的近似方法，将这难以直接测量的温度通过附设热电偶的示值和本文推荐的关系式来确定，于实际情况相比较为吻合．
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| 关 键 词： | 发射率 烘烤温度 |
Determinig the Baking Temperature for Glass High-Vacuum System by Material Emissivities |
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| Sun Xiaoyun,Zhu Yun,Qiu Guohong.Determinig the Baking Temperature for Glass High-Vacuum System by Material Emissivities[J].Journal of China Jiliang University,1994(2). |
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| Authors: | Sun Xiaoyun Zhu Yun Qiu Guohong |
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| Affiliation: | Dept. of Optical and Thenmal Measunement |
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| Abstract: | Presently there exists no convenient method to determine the baking temperaiure for glass vacuum chamber which uciuall plays an important role in the acement of required vacuum circumstance in high-vacuum system made of glass,In this paper approximate method was represented to calculate the baking temperature of glass surface by the emissivities of appropiate materinl surface,determining the baking temperature difficult to be tested by the relation ship recommanded by the paper and the indication of an ausalliary thermocouple.The result is quite agreed with the actual situation. |
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| Keywords: | emissivity baking tcmpctature |
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