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Tailoring Nanostructures Using Copolymer Nanoimprint Lithography |
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| Authors: | Pascal Thébault Stefan Niedermayer Stefan Landis Nicolas Chaix Patrick Guenoun Jean Daillant Xingkun Man David Andelman Henri Orland |
| Affiliation: | 1. CEA, IRAMIS, SIS2M LIONS, CNRS, UMR n° 3299, F‐91191 Gif‐sur‐Yvette Cedex, France;2. CEA‐LETI, F‐38054 Grenoble Cedex, France;3. Raymond and Beverly Sackler School of Physics and Astronomy, Tel Aviv University, Ramat Aviv, Tel Aviv 69978, Israel;4. Institut de Physique Théorique, CEA‐Saclay, 91191 Gif‐sur‐Yvette Cedex, France |
| Abstract: | |
| Keywords: | block copolymers nanolithography nanoimprinting nanostructures |