FIB／SEM双束系统在微纳加工与表征中的应用

简要回顾了聚焦离子束／扫描电子显微镜双束系统在国家纳米科学中心的应用。围绕透射电镜样品制备、扫描电子显微镜与扫描离子显微镜、纳米材料的二维与三维表征等材料表征，以及离子束直接刻蚀加工如光子晶体阵列器件原型加下、材料沉积加工如用于电学性能测试的四电极制作、指定点加工如原子力显微镜针尖修饰、三维加工、电子束曝光及其与聚焦离子束联合加工等纳米结构加工两方面，以一些具体实例分类进行了介绍。针对限制其应用的一些不利因素，如加工效率低、面积小、精度不足、加工损伤等问题，一些新技术如新型离子源Plasma、He^＋／Ne^＋离子等与现有Ga^＋聚焦离子束系统配合将成为未来发展方向。

Applications of FIB/SEM Dual Beam System for Micro-Nanofabrication and Characterization

The applications of Focused Ion Beam （FIB） /Scanning Electron Microscopy （SEM） DualBeam system at National Center for Nanoscience and Technology for micro-nanofabrication and characterization of nanomaterial are briefly reviewed by means of a lot of typical practical examples. Regarding characterization of nanomaterial, the capabilities, such as TEM sample preparation, Scanning Ion Microscopy （SIM）, 2D and 3D characterization of nanomaterial, are illustra- ted. And as for micro-nanofabrication, the applications include ： （ 1 ） direct milling for nanostructures, for instance, pho-tonic array prototyping; （2） precise material deposition, for example, platinum metal deposition for four-electrode meas-urement; （ 3 ） site specific fabrication, such as AFM tip modification ; （ 4 ） 3 D nanofabrication ; （ 5 ） electron beam lithog-raphy （EBL） and its combination with FIB. The application fields of DualBeam system involve material science, electron-ics, life science and natural resources. To extend the application field, a number of new technologies, including various new types ion source, such as plasma, He^＋ and Ne^ ＋ are expected to be used in the near future to overcome some present disadvantages, for instance, low productivity, small fabrication area, bad fabrication precision, FIB induced damage and SO OH.