Contact mechanics of a flexible imprinter for photocured nanoimprint lithography |
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| Authors: | G.M.?McClellandEmail author C.T.?Rettner M.W.?Hart K.R.?Carter M.I.?Sanchez M.E.?Best B.D.?Terris |
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| Affiliation: | (1) IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA;(2) Hitachi Global Storage Technologies, San Jose Research Center, San Jose, CA, 95120, USA;(3) Present address: Department of Polymer Science and Engineering, University of Massachusetts, 01003, USA |
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| Abstract: | A flexible imprinter can be used to accommodate substrate or template roughness in nanoimprint lithography. The contact mechanics of a multi-layer imprinter incorporating bending and local deformation is described. With the right combination of dimensions, moduli, and viscosity, the imprinter can transfer a pattern evenly to a non-flat substrate. These concepts have been used to pattern magnetic media for high density information storage. |
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| Keywords: | imprint nanoimprint lithography contact mechanics |
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