Ion sputtering of cathode surface in a hollow cathode discharge

In this paper, ion sputtering of cathode material in a specific type of glow discharge—hollow cathode discharge (HCD)—is analyzed. To estimate both real sputtering yield and screening effect of the buffer gas, two different methods—combination of experimental and analytical approach (applicable for Ar buffer gas only) and use of Monte Carlo simulations—are used. The latter, which is introduced for the first time here, can be used for any buffer gas. Real sputtering yield S_k is estimated by Monte Carlo simulations for several commercial HCD lamps with Ne buffer gas: Ne-Li (0.046), Ne-As (0.862), Ne-Ca (0.337) and Ne-Cd (1.069).