首页 | 本学科首页   官方微博 | 高级检索  
     

薄膜理想台阶的制备方法研究
引用本文:付文博,梁建华,王维笃,周晓松,杨本福,程贵均.薄膜理想台阶的制备方法研究[J].表面技术,2013,42(6):113-118.
作者姓名:付文博  梁建华  王维笃  周晓松  杨本福  程贵均
作者单位:中国工程物理研究院 核物理与化学研究所, 绵阳 621900;中国工程物理研究院 核物理与化学研究所, 绵阳 621900;中国工程物理研究院 核物理与化学研究所, 绵阳 621900;中国工程物理研究院 核物理与化学研究所, 绵阳 621900;中国工程物理研究院 核物理与化学研究所, 绵阳 621900;中国工程物理研究院 核物理与化学研究所, 绵阳 621900
基金项目:中国工程物理研究院科技发展基金资助项目(2010A0301011)
摘    要:目的 研究台阶的形貌对台阶仪测试的影响,准确测试薄膜的厚度。 方法 分析制备台阶中存在的问题,针对这些问题设计了中轴线位置带掩膜条的掩膜板,并采用该新型掩膜板,在不同衬底上制备台阶,用台阶仪对薄膜的厚度进行测定。 结果 在薄膜中轴线附近做出的台阶,坡度陡峭,上下表面清晰。 Mo 衬底上制备出的薄膜厚度重复性较好;单晶硅衬底上制备的薄膜表面粗糙度较大;石英衬底上制备薄膜形成的台阶上下表面均较为平滑。 结论 使用新型掩膜板在石英衬底上制备出理想台阶,可较为准确地测试薄膜的厚度。

关 键 词:薄膜    膜厚    边缘效应    理想台阶    粗糙度
收稿时间:2013/6/11 0:00:00
修稿时间:2013/7/19 0:00:00

Study on the Preparation Method for Ideal Steps in Thin Films
FU Wen-bo,LIANG Jian-hu,WANG Wei-du,ZHOU Xiao-song,YANG Ben-fu and CHENG Gui-jun.Study on the Preparation Method for Ideal Steps in Thin Films[J].Surface Technology,2013,42(6):113-118.
Authors:FU Wen-bo  LIANG Jian-hu  WANG Wei-du  ZHOU Xiao-song  YANG Ben-fu and CHENG Gui-jun
Affiliation:Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China;Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China;Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China;Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China;Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China;Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China
Abstract:Objective To study the impact of the morphology of steps on the level meter measurement, and to accurately test the thickness of the films. Methods The problems in the preparation of steps were analyzed, the meddle line strip mask was designed based on these problems, and the new mask was used to prepare steps on different substrates, and then the thickness of the films was measured by level meter. Results The steps near the meddle line of thin films had steep slope, and the upper and lower surfaces were clear. The thickness of the films prepared on the polished Mo substrate had good reproducibility; the films on single crystal silicon substrate had large surface roughness; the upper and lower surfaces of the steps of films prepared on quartz substrates were the smoothest . Conclusion The use of new mask can help to prepare the ideal steps on quartz substrates for relatively accurate test of the film thickness.
Keywords:thin films  film thickness  edge effect  the ideal step  roughness
点击此处可从《表面技术》浏览原始摘要信息
点击此处可从《表面技术》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号