ZnO纳米晶薄膜的制备及特性分析 |
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引用本文: | 邓建平,汪敏强,宋孝辉.ZnO纳米晶薄膜的制备及特性分析[J].纳米科技,2013(6):17-21. |
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作者姓名: | 邓建平 汪敏强 宋孝辉 |
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作者单位: | 西安交通大学电子与信息工程学院,陕西西安710049 |
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基金项目: | 基金项目:国家自然科学基金项目(61176056,91123019) |
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摘 要: | 在低温下制备了粒径小于10nm的ZnO纳米晶,用旋涂法制备ZnO纳米晶薄膜,XRD分析ZnO晶相是纤锌矿结构;SEM与AFM表明,纳米晶薄膜在300%退火后薄膜的厚度明显减小到130nm,表面粗糙度降低到3.27nm,粒径明显增大;紫外-可见吸收和透射比光谱表明,随着退火温度的增加,吸收边发生了红移,吸收肩更明显,薄膜具有高的透射率(75—85%);薄膜方阻随温度增加而增大,300℃以下退火方阻增加很小(小于8.5Ω/sq),400℃以上退火方阻大幅增加(大于21.1Ω/sq),因此,ZnO纳米晶薄膜最优退火温度点为300℃。
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关 键 词: | ZnO纳米晶 ZnO薄膜 水热法 旋涂法 |
Preparation and Characteristics Analysis of ZnO Nanocrystalline Film |
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Authors: | DENG Jian-ping WANG Min-qiang SONG Xiao-hui |
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Affiliation: | (School of Electronic and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China) |
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Abstract: | ZnO Nanocrystallines (d〈10 nm) were prepared at low temperature,and then ZnO nanocrystalline films were prepared by spin-coating. XRD analysis confirms that the as-prepared ZnO is hexagonal wurtzite crystal structure. SEM and AFM show that with annealing at 300 ℃,the thickness of the film reduces to 130nm (nonsintered 200 nm) and the surface roughness to 3.27 nm (nonsintered 4.89 nm), and the particle size significantly increases. UV-Visual absorption and transmission spectra show that the absorption edge has shifted to red,the absorption shoulder widen and the transparency of all films are 75-85%. With the increase of annealing temperature, the sheet resistance of the films increases from 8.5 Ω/sq at below 300 ℃ to 21.1 Ω/sq at above 400℃. Therefore,the optimal annealing temperatures (300 ℃) was proposed. |
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Keywords: | ZnO Nanocrystalline ZnO film hydrothermal method spin-coated method |
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