Modeling of the intrinsic retention characteristics of FLOTOXEEPROM cells under elevated temperature conditions |
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| Authors: | Papadas C Pananakakis G Ghibaudo G Riva C Pio F Ghezzi P |
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| Affiliation: | Central R&D, SGS-Thomson Microelectron., Crolles; |
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| Abstract: | A model for the intrinsic retention characteristics of FLOTOX EEPROM cells is presented, which is based on the temperature dependence of the Fowler-Nordheim emission current. This model which has been successfully tested on single-poly-FLOTOX EEPROM cells, enables the device lifetime to be calculated for given memory operating conditions, instead of being extrapolated as is usually done. The sensitivity of the retention characteristics to several technological parameters is also investigated. It is expected that this intrinsic retention model (with minor modifications) will also be applicable to FLASH EEPROM cells |
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