| Abstract: | The crystallization of NiTi shape memory alloy sputter deposition film in the course of sputtering deposition and that after heat treated were studied. The relationship between the process factors, such as substrate type, temperature, as well as the crystallization when heat treated after plating was investigated. The results show that a new phase precipitates during heat treatment after sputtering deposition and the degree of crystallization among different layers and the stress in grains are obviously different. |
