相位扫描法制作变栅距光栅

提出了一种制作变栅距(VLS)光栅的相位扫描方法。该方法的主要装置包括一个用于控制刻划机运动的光栅干涉仪和一个相位扫描机构。如果调整光栅干涉仪,保证接收场中只有两条干涉条纹,然后改变用于对条纹进行计数的光电传感器的位置,就可以刻划出具有变栅距的刻槽。对光电式光栅刻划机的控制系统和结构都做了详细论述。按照上述方法成功刻划出了试验性的VLS光栅,它的最小栅距增量为0.33nm,并对在制作过程中产生的误差进行了讨论。采用测量衍射角的方法进行了栅距检测试验,由变栅距光栅和等栅距光栅作出的拟合曲线表明:相位扫描方法是加工具有亚纳米栅距增量的VLS光栅的有效方法,该方法对超精密定位也具有借鉴作用。

Phase scanning method for fabricating varied line-space gratings

A phase scanning method for fabricating varied line-space (VLS) grating is put forward. The main devices of the method include a grating interferometer, which controls the ruling engine motion, and a phase scanning mechanism. If adjusting the grating interferometer to ensure that there are only two interference fringes in the detecting field and then changing the position of the photoelectric sensor, for counting the fringes, the grooves with varied line spaces can be ruled. An experimental VLS plane grating with 0.33 nm minimum space increments was ruled successfully according to the method described above. A space- measurement experiment by means of diffraction angle measurement is carried out. The fitting curves coming from VLS grating and from equivalent space grating indicate that the phase scanning method is valid in fabricating VLS grating with sub-nanometer space increments and it plays a reference role for super-precision positioning.