深刻蚀高密度熔融石英光栅

深刻蚀高密度熔融石英光栅是一种新型高效的衍射光学元件,具有衍射效率高、成本低、抗损伤,能在高强度激光条件下工作等优点。给出了利用感应耦合等离子体(ICP)技术制作熔融石英深刻蚀光栅的详细过程,并在一定的优化条件下制作了一系列不同周期、开口比和深度的高质量深刻蚀石英光栅。实验得到的最大刻蚀深度为4μm,并且在600 l/mm的高密度条件下得到了刻蚀深度为1.9μm的高深宽比石英光栅。光栅侧壁陡直,表面平整,没有聚合物沉积。所制作的熔融石英光栅元件在高强激光环境、光谱仪、高效滤波器和波分复用系统等领域中有非常广泛的用途。

Deep Etched High-Density Fused Silica Phase Gratings

Deep etched high-density fused silica grating is a new diffractive optical element with advantages of high diffraction efficiency, and low cost. In this paper, the detailed fabrication process of microoptical deep etched fused silica phase gratings is presented with inductively coupled plasma (ICP) technology. Deep etched phase gratings with different periods, depths, and duty cycles have been fabricated under an optimized etching condition. An etched depth of 1.9 μm has been achieved on a grating with a high density of 600 lines/mm. The fabricated gratings have vertical sidewalls, planar surfaces with no polymer deposition. The biggest etched depth is about 4 μm. The fabricated gratings are very useful optical elements in the fields such as intensive laser environment, spectrometer, high-efficient filter, and wavelength-division-multiplexing system, etc.