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Modeling of Laser-Induced Chemical Vapor Deposition of Silicon Carbide Rods from Tetramethylsilane
Authors:Mohammed S. Shaarawi  Juan M. Sanchez  Honghua Kan  Arumugam Manthiram
Affiliation:Texas Materials Institute, The University of Texas at Austin, Austin, Texas 78712
Abstract:
Finite-difference fluid-dynamics modeling has been used to predict deposition rates, fractional amounts of phases, and deposition morphology for the codeposition of silicon carbide and pyrolitic carbon from tetramethylsilane via laser-induced chemical vapor deposition (LCVD). Calculated results agree fairly well with rod deposition experiments. The morphologic features of rods that have been grown using LCVD are examined and explained using the results of the finite-difference calculations.
Keywords:silicon carbide    chemical vapor deposition    microstructure
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