Laser-induced breakdown in crystalline and amorphous SiO2 |
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Authors: | Soileau M. Bass M. |
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Affiliation: | Michelson Laboratory, Naval Weapons Center, China Lake, CA, USA; |
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Abstract: | The 1.06 μm breakdown thresholds of crystalline and amorphous SiO2were compared. These materials showed dependences of the breakdown threshold on the focal volume which are consistent with a multiphoton-assisted electron avalanche damage mechanism. |
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