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多铁性BaTiO3/La2/3Sr1/3MnO3复合薄膜的制备及其强磁电效应的研究
引用本文:李廷先,张铭,胡州,李扩社,于敦波,严辉.多铁性BaTiO3/La2/3Sr1/3MnO3复合薄膜的制备及其强磁电效应的研究[J].无机材料学报,2012(3):291-295.
作者姓名:李廷先  张铭  胡州  李扩社  于敦波  严辉
作者单位:北京工业大学材料科学与工程学院;北京有色金属研究总院稀土材料国家工程研究中心
基金项目:国家自然科学基金(51002013,1174021);北京市自然科学基金(2122007)~~
摘    要:使用脉冲激光沉积技术,在(001)取向的LaAlO3(LAO)单晶基片上外延生长了BaTiO3/La2/3Sr1/3MnO3(BTO/LSMO)双层复合薄膜.电学和磁学性能的研究显示复合薄膜具有较低的相对介电常数(εr=263),优良的铁电和铁磁性能以及高于室温的铁磁居里温度(Tc=317 K).复合薄膜的磁电电压系数(αE)为176 mV/A,高于同类结构磁电系统一个数量级,相应的界面耦合系数k值为0.68,表明铁磁层和铁电层界面之间存在较大程度的耦合.

关 键 词:磁电效应  铁电/铁磁复合薄膜  脉冲激光沉积  界面耦合系数

Preparation and Strong Magnetoelectric Effect of Multiferroic BaTiO3/La2/3Sr1/3MnO3 Composite Film
LI Ting-Xian,ZHANG Ming,HU Zhou,LI Kuo-She,YU Dun-Bo,YAN Hui.Preparation and Strong Magnetoelectric Effect of Multiferroic BaTiO3/La2/3Sr1/3MnO3 Composite Film[J].Journal of Inorganic Materials,2012(3):291-295.
Authors:LI Ting-Xian  ZHANG Ming  HU Zhou  LI Kuo-She  YU Dun-Bo  YAN Hui
Affiliation:1(1.College of Materials Science and Engineering,Beijing University of Technology,Beijing 100124,China;2.National Engineering Research Central for Rare Earth Materials,General Research Institute for Nonferrous Metals,Beijing 100088,China)
Abstract:Using pulsed laser deposition technique,the multiferroic BaTiO3/La2/3Sr1/3MnO3composite bilayer films were epitaxially prepared on(001) oriented LaAlO3 single crystal substrate.The measurements of electric and magnetic properties showed that the composite structure possessed superior ferromagnetic and ferroelectric properties,its relative dielectric constant and ferromagnetic curie temperature were 263 and 317 K,respectively.The magnetoelectric voltage coefficient for the bilayer films at room temperature was around 176 mV/A,which was at least one order of magnitude higher than the previous reported in the same structures.The corresponding interface coupling parameter k was about 0.68,which indicated a better interface coupling between ferromagnetic and ferroelectric layers.
Keywords:magnetoelectric effect  ferroelectric/ferromagnetic bilayer heterostructure  pulsed laser deposition  interface coupling parameter
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