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Simulation and analysis of the capacitance–voltage characteristics of the δ-doped semiconductors
Authors:D. G. Liu  C. P. Lee
Abstract:In this paper, a self-consistent model to simulate the general characteristics of one-dimensional semiconductor structures is demonstrated. During calculation, possible quantum effects and the distributions of both electrons and holes are all considered. In this model, a continuity equation is solved to calculate the distribution of free electrons and holes. The possible quantum wells are sought using the Schrödinger equation. The overall charge density and potential are obtained self-consistently by an iteration scheme. The CV characteristics of the δ-doped structures are simulated and then compared with those of practical samples. By comparing with these δ-doped samples, the effective numbers of dopant atoms can be precisely determined. For these highly doped samples, it is found that the activation rates are only about half. This finding can be verified by Hall measurements which confirms the accuracy in this study.
Keywords:Semiconductor doping   Computer simulation   Semiconductor device structures   Semiconductor quantum wells   Electrons   Capacitance   Charge carriers   Current density   Semiconductor device models   Iterative methods   Self consistent calculation
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