Photoluminescence of anti-modulation-doped GaAs/AlGaAs single quantum well structures exposed to hydrogen plasma

Techniques of low-temperature photoluminescence (PL), photoluminescence excitation, and photoreflectance were used to study the effect of hydrogen plasma treatment at 260°C on antimodulation Si-doped GaAs/AlGaAs heterostructures with near-surface single quantum wells (QWs) grown by molecular-beam epitaxy. It was found that, in the case of excitation below the AlGaAs band gap, exciton PL from the QW is quenched due to an increase in the electric field in the structure. The reason for this is that the passivation of surface states by hydrogen results in the Fermi level depinning from the midgap of the nominally undoped p-type GaAs cap layer, while shallow-level impurities present in the layers of the structure are not neutralized (their complexes with hydrogen dissociate under the influence of illumination and strong electric fields).