首页 | 本学科首页   官方微博 | 高级检索  
     


RM 8111: Development of a Prototype Linewidth Standard
Authors:Michael W Cresswell  William F Guthrie  Ronald G Dixson  Richard A Allen  Christine E Murabito  J V Martinez De Pinillos
Affiliation:National Institute of Standards and Technology, Gaithersburg, MD 20899
Abstract:Staffs of the Semiconductor Electronics Division, the Information Technology Laboratory, and the Precision Engineering Laboratory at NIST, have developed a new generation of prototype Single-Crystal CD (Critical Dimension) Reference (SCCDRM) Materials with the designation RM 8111. Their intended use is calibrating metrology instruments that are used in semiconductor manufacturing. Each reference material is configured as a 10 mm × 11 mm silicon test-structure chip that is mounted in a 200 mm silicon carrier wafer. The fabrication of both the chip and the carrier wafer uses the type of lattice-plane-selective etching that is commonly employed in the fabrication of micro electro-mechanical systems devices. The certified CDs of the reference features are determined from Atomic Force Microscope (AFM) measurements that are referenced to high-resolution transmission-electron microscopy images that reveal the cross-section counts of lattice planes having a pitch whose value is traceable to the SI meter.
Keywords:AFM  calibration  CD  dimensional standards  HRTEM  lattice-plane selective etch  linewidth  metrology  SCCDRM  reference materials  single-crystal silicon  traceability  uncertainty
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号