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Fluorographene: a two-dimensional counterpart of Teflon
Authors:Nair Rahul R  Ren Wencai  Jalil Rashid  Riaz Ibtsam  Kravets Vasyl G  Britnell Liam  Blake Peter  Schedin Fredrik  Mayorov Alexander S  Yuan Shengjun  Katsnelson Mikhail I  Cheng Hui-Ming  Strupinski Wlodek  Bulusheva Lyubov G  Okotrub Alexander V  Grigorieva Irina V  Grigorenko Alexander N  Novoselov Kostya S  Geim Andre K
Affiliation:School of Physics and Astronomy, University of Manchester, Manchester, M13 9PL, UK.
Abstract:A stoichiometric derivative of graphene with a fluorine atom attached to each carbon is reported. Raman, optical, structural, micromechanical, and transport studies show that the material is qualitatively different from the known graphene-based nonstoichiometric derivatives. Fluorographene is a high-quality insulator (resistivity >10(12) Ω) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting a Young's modulus of 100 N m(-1) and sustaining strains of 15%. Fluorographene is inert and stable up to 400 °C even in air, similar to Teflon.
Keywords:graphene  fluorination  fluorographene  Teflon
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