Role of hydrazine monohydrate during texturization of large-area crystalline silicon solar cell fabrication |
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Authors: | U. Gangopadhyay Kyunghae Kim Ajoy Kandol Junsin Yi H. Saha |
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Affiliation: | aIC Design and Fabrication Centre, Electronics and Tele-communication, Engineering Department, Jadavpur University, Kolkata 700032, India;bSchool of Electrical and Computer Engineering, Sungkyunkwan University, 300 Chunchun-dong, Jangan-gu, Suwon 440-746, Republic of Korea |
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Abstract: | Reduction of optical losses in monocrystalline silicon solar cells by surface texturing is one of the important issues of modern silicon photovoltaic. For texturization during commercial monocrystalline silicon solar cell fabrication, a mixture of NaOH or KOH and isopropyl alcohol (IPA) is generally used in order to achieve good uniformity of pyramidal structure on the silicon surface. The interfacial energy between silicon and electrolyte should be reduced in order to achieve sufficient wettability for the silicon surface which in turn will enhance the pyramid nucleation. In this work, we have investigated the role of hydrazine monohydrate as a surface-active additive, which supplies OH− ions after dissociation. This cuts down the IPA consumption during texturing without any loss of uniformity of textured pyramid. We are probably the first group to report such a novel idea of using hydrazine monohydrate addition in NaOH solution for texturization of solar cell. We were able to fabricate monocrystalline silicon solar cells with more than 85% yield in the range of 14–15% efficiency. |
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Keywords: | Texturization Hydrazine IPA Low cost Silicon Solar cell |
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