| 等离子弧淬火单片机控制系统的研究 |
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| 引用本文： | 于光平,刘冰,杨静山.等离子弧淬火单片机控制系统的研究[J].东北电力技术,2011,32(1):5-7,27. |
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| 作者姓名： | 于光平 刘冰 杨静山 |
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| 作者单位： | 沈阳工业大学,辽宁,沈阳,110870 |
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| 摘 要： | 等离子弧淬火热源装置热效率高,成本低,有巨大的发展潜力.等离子弧淬火单片机控制系统通过双反馈环节(高速反馈控制环节和低速总体趋势控制环节)实现淬火过程中对淬火电流的稳定控制,使系统在特殊干扰下或失控时工件得到快速保护而不被烧蚀.设计的等离子弧淬火单片机控制系统的控制过程具有智能调节功能,可提高工件淬火稳定性从而提高淬火...
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| 关 键 词： | 等离子弧淬火 单片机 抗干扰 |
Study on MCU Control System with Plasma Arc Quenching |
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| YU Guang-ping,LIU Bing,YANG Jing-shan.Study on MCU Control System with Plasma Arc Quenching[J].Northeast Electric Power Technology,2011,32(1):5-7,27. |
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| Authors: | YU Guang-ping LIU Bing YANG Jing-shan |
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| Affiliation: | YU Guang-ping LIU Bing YANG Jing-shan |
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| Abstract: | Heat source device with plasma arc quenching is of great capacity for its high thermal efficiency and low cost.MCU control system with plasma arc quenching.In MCU control system with plasma arc quenching,stability control of quenching current is implemented by bi-feedback procedures(high-speed feedback control and low-speed overall trend control),so that the workpiece can quickly be protected from ablation under special interference or out of control.The designed controlling procedure of MCU control system ... |
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| Keywords: | Plasma arc quenching MCU Strong interference |
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