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微波消解-电感耦合等离子体原子发射光谱法测定钒铁中7种杂质元素
引用本文:霍红英.微波消解-电感耦合等离子体原子发射光谱法测定钒铁中7种杂质元素[J].冶金分析,2018,38(2):65-70.
作者姓名:霍红英
作者单位:攀枝花学院,国家钒钛检测重点实验室,四川攀枝花 617000
基金项目:国家质检总局科技项目(2014IK139);攀枝花市科技计划基础研究及科研院所能力提升项目(2015CY-G-27)
摘    要:利用X射线衍射法对钒铁酸溶前后的物相进行对比分析,发现酸溶残渣的主要成分为硅铝氧化物,因此可以使用混酸、在高压下提高反应温度的微波消解技术处理样品。采用硝酸、盐酸、氢氟酸混合酸并使用微波消解两步升温法处理样品,选择Si 251.611nm、Al 394.401nm、Mn 257.610nm、P 178.284nm、As 189.042nm、Cu 324.754nm、Ni 231.604nm为分析谱线,采用基体匹配法绘制校准曲线消除基体效应的影响,使用电感耦合等离子体原子发射光谱法(ICP-AES)同时测定硅、铝、锰、磷、砷、铜、镍,从而建立了钒铁中硅、铝、锰、磷、砷、铜、镍等杂质元素的分析方法。各待测元素校准曲线的线性相关系数r均大于0.9995;方法中各元素检出限为0.0001%~0.0013%(质量分数)。方法应用于两个钒铁标准样品中硅、铝、锰、磷、砷、铜、镍测定,结果的相对标准偏差(RSD,n=8)不大于4%,测定值与认定值相符合。

关 键 词:微波消解  电感耦合等离子体原子发射光谱法(ICP-AES)  钒铁  杂质元素  
收稿时间:2017-09-25

Determination of 7 impurity elements in ferrovanadiumalloy by inductively coupled plasma atomic emissionspectrometry with microwave digestion
HUO Hong-ying.Determination of 7 impurity elements in ferrovanadiumalloy by inductively coupled plasma atomic emissionspectrometry with microwave digestion[J].Metallurgical Analysis,2018,38(2):65-70.
Authors:HUO Hong-ying
Affiliation:State Key Laboratory for Vanadium & Titanium Testing, Panzhihua University, Panzhihua 617000, China
Abstract:The phases in ferrovanadium before and after acid dissolution were analyzed and compared by X-ray diffraction. It was found that the main composition of residues after acid dissolution was silicon-aluminum oxide. Therefore, the sample could be treated with mixed acid by microwave digestion technology to increase the reaction temperature at high pressure. In this study, the sample was dissolved with nitric acid-hydrochloric acid-hydrofluoric acid mixture and treated by microwave digestion with tow-step temperature rising. Si 251.611nm, Al 394.401nm, Mn 257.610nm, P 178.284nm, As 189.042nm, Cu 324.754nm and Ni 231.604nm were selected as the analytical line. The calibration curve was prepared by matrix matching method to eliminate the influence of matrix effect. The simultaneous determination of silicon, aluminum, manganese, phosphorus, arsenic, copper and nickel impurities in ferrovanadium by inductively coupled plasma atomic emission spectrometry (ICP-AES) with microwave digestion was established. The linear correlation coefficients (r) of calibration curves for testing elements were all higher than 0.9995. The detection limits of elements in this method were in range of 0.0001%-0.0013% (mass fraction). The proposed method was applied for the determination of silicon, aluminum, manganese, phosphorus, arsenic, copper and nickel in two ferrovanadium standard samples. The relative standard deviations (RSD, n=8) of determination results were less than 4%, and the found results were consistent with the certified values.
Keywords:microwave digestion  inductively coupled plasma atomic emission spectrometry (ICP-AES)  ferrovanadium  impurity element  
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