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特殊器件低温烘烤排气的实验研究
引用本文:米伦,马蔚珊.特殊器件低温烘烤排气的实验研究[J].真空与低温,2004,10(4):211-214.
作者姓名:米伦  马蔚珊
作者单位:中国工程物理研究院,电子工程研究所,四川,绵阳,621900
摘    要:针对特殊器件烘烤温度低于200℃的要求,分析了影响管内真空度的相关因素,进行了升温过程中烘烤温度对真空度影响的实验研究,取得了在约170℃时器件内材料放气量大、真空度相对最低等相关数据,依此确定了升温速率及烘烤工艺。

关 键 词:真空排气  烘烤温度  真空度
文章编号:1006-7086(2004)04-0211-04
修稿时间:2004年7月7日

EXPERIMENTAL STUDIES ON SPECIAL DEVICE DEGASSING AT LOWER BAKING TEMPERATURE
MI Lun,MA Wei-shan.EXPERIMENTAL STUDIES ON SPECIAL DEVICE DEGASSING AT LOWER BAKING TEMPERATURE[J].Vacuum and Cryogenics,2004,10(4):211-214.
Authors:MI Lun  MA Wei-shan
Abstract:The baking temperature of a certain special device is in need of under 200-centdegree. The influence of baking temperature on degree of vacuum during heating up was experimental studied. Correlative influencing factors were analyzed. The results show that outgassing quantity of device is maximum and degree of vacuum is minimum at 170-centdegree, accordingly, the vacuum exhaust technological standards are determined.
Keywords:vacuum exhaust  baking temperature  degree of vacuum
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