Nanotribological properties of ALD-processed bilayer TiO2/ZnO films |
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| Affiliation: | 1. Department of Mechanical Engineering, National Chiao Tung University, Hsinchu 300, Taiwan, ROC;2. Department of Electrophysics, National Chiao Tung University, Hsinchu 300, Taiwan, ROC;3. Department of Mechantronic Technology, National Normal University, Taipei 106, Taiwan, ROC;4. Department of Mechanical Engineering, Chin-Yi University of Technology, Taichung 400, Taiwan, ROC;5. Central Labs, Advanced Semiconductor Engineering, Inc., 26 Chin 3rd Rd., Nantze Export Processing Zone, 811 Nantze, Kaohsiung, Taiwan, ROC;1. Lviv Polytechnic National University, 12 Bandera str., Lviv 79013, Ukraine;2. Lviv Institute of Materials of SRC “Carat”, 202 Stryjska str., Lviv 79031, Ukraine;3. Lviv State University of Life Safety, 35 Kleparivska str., Lviv 79007, Ukraine;4. Jan Dlugosz University, 13/15 Al. Armii Krajowej, Czestochowa 42201, Poland;5. Drohobych State Pedagogical University, 24 Ivan Franko str., Drohobych 82100, Ukraine;1. Institute of Photo-Electronics Thin Film Devices and Technology, Key Laboratory of Photo Electronics Thin Film Devices and Technology of Tianjin, Ministry of Education, Tianjin 300071, China;2. Institute of Photo-Electronics Thin Film Devices and Technology, Key Laboratory of Optoelectronic Information Science and Technology, Ministry of Education, Tianjin 300071, China;1. Philips Research, High Tech Campus 34-6, 5656AE Eindhoven, The Netherlands;2. Department of Mechanical Engineering, Eindhoven University of Technology, PO Box 513, 5600MB Eindhoven, The Netherlands;1. Department of E&C Engg., Manipal University, Manipal 576104, India;2. Department of E&C Engg., RVCE, Bangalore 560059, India;3. Microton Centre., Department of Physics, Mangalore University, Mangalore 574199, India;4. Department of Materials Science, Mangalore University, Mangalore 574199, India;5. Department of Physics, Manipal University, Manipal 576104, India |
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| Abstract: | TiO2/ZnO films grown by atomic layer deposition (ALD) demonstrated nanotribological behaviors using scratch testing. TEM profiles obtained an amorphous structure TiO2 and nanocrystalline structure ZnO, whereas the sample has significant interface between the TiO2/ZnO films. The experimental results show the relative XRD peak intensities are mainly contributed by a wurtzite oxide ZnO structure and no signal from the amorphous TiO2.With respect to tribology, increased friction causes plastic deformation between the TiO2 and ZnO films, in addition to delamination and particle loosening. The plastic deformation caused by adhesion and/or cohesion failure is reflected in the nanoscratch traces. The pile-up events at a loading penetration of 30 nm were measured at 21.8 μN for RT, 22.4 μN for 300 °C, and 36 μN for 400 °C. In comparison to the other conditions, the TiO2/ZnO films annealed at 400 °C exhibited higher scratch resistance and friction with large debris, indicating the wear volume is reduced with increased annealing temperature and loading. |
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| Keywords: | CVD coatings Nanotribology Scratch testing Sliding friction |
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